Tantalum metal powder
Product introduction of Tantalum metal powder
Molecular formula: Ta
Atomic number: 73
Density: 16.68g/cm ³
Boiling point: 5425 ℃
Melting point: 2980 ℃
Vickers hardness in annealed state: 140HV environment.
Purity: 99.9%
sphericity: ≥ 0.98
Hall flow rate: 13 ″ 29
loose density: 9.08g/cm3
tap density: 13.42g/cm3
particle size distribution: 15-45 μ m, 15-53 μ m, 45-105 μ m, 53-150 μ m,40nm,70nm,100nm,200nm or according to client's demand
Product index of Tantalum metal powder
ITEM | SPECIFICATIONS | TEST RESULTS | ||||||
Appearance | Dark Gray Powder | Dark Gray Powder | ||||||
Assay | 99.9%Min | 99.9% | ||||||
Particle Size | 40nm,70nm,100nm,200nm | |||||||
Impurities(%,Max) | ||||||||
Nb | 0.005 | 0.002 | ||||||
C | 0.008 | 0.005 | ||||||
H | 0.005 | 0.005 | ||||||
Fe | 0.005 | 0.002 | ||||||
Ni | 0.003 | 0.001 | ||||||
Cr | 0.003 | 0.0015 | ||||||
Si | 0.005 | 0.002 | ||||||
W | 0.003 | 0.003 | ||||||
Mo | 0.002 | 0.001 | ||||||
Ti | 0.001 | 0.001 | ||||||
Mn | 0.001 | 0.001 | ||||||
P | 0.003 | 0.002 | ||||||
Sn | 0.001 | 0.001 | ||||||
Ca | 0.001 | 0.001 | ||||||
Al | 0.001 | 0.001 | ||||||
Mg | 0.001 | 0.001 | ||||||
Cu | 0.001 | 0.001 | ||||||
N | 0.015 | 0.005 | ||||||
O | 0.2 | 0.13 |
Application of Tantalum metal powder
The dense oxide film produced on the surface of tantalum powder has the properties of single-phase conductive valve metal, high resistivity, high dielectric constant, earthquake resistance, and long service life. It has important applications in high-tech fields such as electronics, metallurgy, steel, chemical engineering, hard alloys, atomic energy, superconducting technology, automotive electronics, aerospace, medical and health, and scientific research.
Advantages of Tantalum metal powder
1. High sphericity
2. Few satellite balls in the powder
3. Good flowability 4. Controllable particle size distribution of the powder
5. Almost no hollow powder
6. High loose density and tap density
7. Controllable chemical composition and low oxygen content
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