Tantalum Metal Powder| High Purity99.9% | High Performance

Product Description
Product introduction of Tantalum metal powder
Tantalum powder is a critical high-performance refractory metal powder with exceptional properties that make it indispensable in numerous advanced applications. Our premium tantalum powder is manufactured using state-of-the-art processes to ensure the highest quality, purity, and performance characteristics required by demanding industries worldwide.
(Property) | (Value/Description) |
---|---|
Molecular Formula | Ta |
Atomic Number | 73 |
Density | 16.68 g/cm³ |
Boiling Point | 5425 ℃ |
Melting Point | 2980 ℃ |
Vickers hardness in annealed state | 140 HV |
Purity | 99.9% |
Sphericity | ≥ 0.98 |
Hall Flow Rate | 13-29 秒 (s) |
Loose Density | 9.08 g/cm³ |
Tap Density | 13.42 g/cm³ |
Particle Size | Micro size:15-45 μm, 15-53 μm, 45-105 μm, 53-150 μm Nano size :40 nm, 70 nm, 100 nm, 200 nm or according to client's demand |
Our tantalum metal powder is a high-purity metal powder with the following significant characteristics:
- High Purity: Advanced production processes are used to ensure high product purity and meet stringent application requirements.
- Excellent Corrosion Resistance: Tantalum exhibits excellent stability in various corrosive media.
- High Melting Point: Tantalum's melting point is as high as 2996℃, allowing it to maintain stable performance in high-temperature environments.
- Good Electrical Properties: Tantalum has a wide range of applications in the electronics field, especially in capacitor manufacturing.
Product index of Tantalum metal powder
ITEM | SPECIFICATIONS | TEST RESULTS | ||||||
Appearance | Dark Gray Powder | Dark Gray Powder | ||||||
Assay | 99.9%Min | 99.9% | ||||||
Particle Size | 40nm,70nm,100nm,200nm | |||||||
Impurities(%,Max) | ||||||||
Nb | 0.005 | 0.002 | ||||||
C | 0.008 | 0.005 | ||||||
H | 0.005 | 0.005 | ||||||
Fe | 0.005 | 0.002 | ||||||
Ni | 0.003 | 0.001 | ||||||
Cr | 0.003 | 0.0015 | ||||||
Si | 0.005 | 0.002 | ||||||
W | 0.003 | 0.003 | ||||||
Mo | 0.002 | 0.001 | ||||||
Ti | 0.001 | 0.001 | ||||||
Mn | 0.001 | 0.001 | ||||||
P | 0.003 | 0.002 | ||||||
Sn | 0.001 | 0.001 | ||||||
Ca | 0.001 | 0.001 | ||||||
Al | 0.001 | 0.001 | ||||||
Mg | 0.001 | 0.001 | ||||||
Cu | 0.001 | 0.001 | ||||||
N | 0.015 | 0.005 | ||||||
O | 0.2 | 0.13 |
Application of Tantalum metal powder
Electronics Industry
- Capacitors: The primary application, where tantalum provides high capacitance in small volumes
- Sputtering Targets: For thin film deposition in semiconductor manufacturing
- Resistors: For high-precision electronic components
- Heat Sinks: For thermal management in advanced electronics
Aerospace and Defense
- Gas Turbine Components: For parts requiring high-temperature corrosion resistance
- Rocket Nozzles: Withstands extreme operating conditions
- Missile Components: Where reliability under extreme conditions is critical
- Aircraft Fasteners: For structural integrity in demanding environments
Medical Industry
- Surgical Implants: Due to excellent biocompatibility
- Pacemaker Components: For long-term reliability
- Orthopedic Devices: For strength and biocompatibility
- Dental Instruments: For durability and resistance to sterilization
Chemical Processing
- Reaction Vessels: For handling corrosive chemicals
- Heat Exchangers: For aggressive environments
- Pump Components: For chemical transfer applications
- Valve Parts: For controlling corrosive fluid flow
Metallurgical Applications
- Alloy Additives: To enhance strength and corrosion resistance
- Carbide Cutting Tools: For enhanced hardness and wear resistance
- Powder Metallurgy: For producing complex-shaped components
- Coating Materials: For wear and corrosion protection
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