Shanghai Xinglu eget suppleret princeps puritatemTantalum chlorideTacl5 99.95% et 99.99%
Tantalum chlorideestPura alba pulverisCum M. formulaTacl5. Molecular pondus (XXXV) DCCCXXI, Liquid Point CCXVI ℃, ferventis Point CCXXXIX IV ℃, dissolvi in Vocatus, aether, carbonis tetrachloride et portavit cum aqua.
Et applications:sunt ferroelectric tenuis films, organicum reactionem chlorination agente, tantalis cadmiae coating, praeparatio excelsum CV Tantalum pulveris, supercapacitor, etc.
I. Fortis adhaesionem formatur super superficiem electronic components, semiconductor cogitationes, Titanium et metallum nitride electrodes et metallum Tungsten superficiei, cum crassitudine 0,1 μ M-gradu pertransulatio film in altum dielectric constant.
2. In the chlor alkali industry, electrolytic copper foil, oxygen production industry, recycling of electrolytic anode surfaces, and wastewater industry, it is mixed with ruthenium compounds and platinum group compounds to form oxide conductive films, improve membrane adhesion, and extend electrode service life by more than 5 years.
III. Praeparatio Ultrafine Tantalum Pentoxide.
Insuper, Tantalum Pentachloride N-Butanol solutio et Tantalum Pentachloride Isopropanol solutio potest suppetere magis notitia velit sentire liberum contactus nobissales@shxlchem.com
Post tempus: Apr-04-2023