Gradus nuclei hafnium oxydatum

Brevis descriptio:

Product Name: Hafnium oxydatum nuclei gradus
CAS: 12055-23-1
MF: HfO2
MW:210.49
EINECS: 235-013-2

Product Detail

Product Tags

Species et descriptio

Hafnium oxydatumprincipale oxydi hafnii, est album inodorum et insulsum in communibus rebus.

Nomen: hafnium dioxide	Formulae chemica:HfO2
Pondus hypotheticum: 210.6	Densitas: 9.68 g/cm3
Punctum liquescens : 2850	Fervens punctum: 5400

Product possessiones

Hafnium oxydatum genus non-toxicum et insipidum album solidum, non in aqua resolutum, acidum hydrochloricum et acidum nitricum, solutum est in acido sulphurico et hydrogenio fluoride acido chemico pigra, cum proprietatibus tenuibus cinematographicis: range pellucidis. ～12000nm；refractivus index（250nm）～2.15 500nm）～2， cum puncto magno liquescens, sic amplis finium usuum habet.

Applicationem

I) rudis materiae forhafnium metallicumet ejus composita;

2) Materiae refractariae, tunicae radioactivae et catalystae speciales;

3) Maximum robur vitreum efficiens.

Qualitas signa:

Inceptum vexillum: compositio mensa chemica massa fractio/% gradus nuclei hafnium oxydatum

Product gradus			Primo gradu	Secundus gradus	Tertius gradus	Nota
Product numerus			SHXLHFO2-01	SHXLHFO2-02	SHXLHFO2-03
Compositio chemica (fractio massa)/%	immunditias	Hf O*₂	≥98	≥98	≥95
		Al	≤0.010	≤0.010	≤0.020
		B	≤0.0025	≤0.0025	≤0.003
		Cd	≤0.0001	≤0.0001	≤0.0005
		Cr	≤0.005	≤0.005	≤0.010
		Cu	≤0.002	≤0.002	≤0.0025
		Fe	≤0.030	≤0.030	≤0.070
		Mg	≤0.010	≤0.010	≤0.015
		Mn	≤0.001	≤0.001	≤0.002
		Mo	≤0.001	≤0.001	≤0.002
		Ni	≤0.002	≤0.002	≤0.0025
		P	≤0.001	≤0.001	≤0.002
		Si	≤0.010	≤0.010	≤0.015
		Sn	≤0.002	≤0.002	≤0.0025
		Ti	≤0.010	≤0.010	≤0.020
		V	≤0.001	≤0.001	≤0.0015
		Zr	Zr≤0.20	0.20＜Zr＜0.35	0.35＜Zr＜0.50
		Igloss (950℃)	1.0	1.0	2.0
		particula	-325mesh≥95%, -600mesh≤35%