Hafnium, isinyithi i-Hf, inombolo ye-athomu engu-72, ubunzima be-atom 178.49, yintsimbi ekhanyayo yesilivere engwevu.
I-Hafnium ine-isotopes ezintandathu ezizinzileyo ngokwendalo: i-hafnium 174, i-176, i-177, i-178, i-179, kunye ne-180. Eli gama livela kwigama lesiLatini leSixeko saseCopenhagen.
Ngomnyaka we-1925, isazi samachiza saseSweden uHervey kunye nesazi sefiziksi saseDatshi uKoster bafumana ityuwa ye-hafnium ecocekileyo nge-fractional crystallization ye-fluorinated complex salts, kwaye bayinciphisa nge-metallic sodium ukufumana i-hafnium yensimbi ecocekileyo. I-Hafnium iqulethe i-0.00045% ye-crust yomhlaba kwaye ihlala ihambelana ne-zirconium kwindalo.
Igama lemveliso: hafnium
Isimboli ye-Element: Hf
Ubunzima beathom: 178.49
Uhlobo lwe-Element: intsimbi yentsimbi
Iimpawu ezibonakalayo:
Hafniumyintsimbi engwevu yesilivere ekhazimlayo; Kukho iintlobo ezimbini ze-metal hafnium: i-α Hafnium yi-hexagonal epakishwe ngokusondeleyo (1750 ℃) enobushushu obuphezulu benguqu kune-zirconium. I-Metal hafnium ineentlobo ze-allotrope kumaqondo obushushu aphezulu. I-Metal hafnium ine-neutron ephezulu yokufunxa i-cross-section kwaye ingasetyenziswa njengento yokulawula i-reactors.
Kukho iintlobo ezimbini zezakhiwo zekristale: ukupakishwa kwe-hexagonal dense kumaqondo okushisa angaphantsi kwe-1300 ℃（ α- Equation); Kumaqondo obushushu angaphezu kwe-1300 ℃, yicubic egxile kumzimba (beta-Equation). Isinyithi esineplastikhi esiqina kwaye sibe brittle phambi kokungcola. Izinzile emoyeni, iba mnyama kuphela kumphezulu xa itshisiwe. Imicu inokuvuswa lilangatye lematshisi. Iipropati ezifana ne-zirconium. Ayichaphazeli ngamanzi, i-acids dilute, okanye iziseko ezomeleleyo, kodwa inyibilika ngokulula kwi-aqua regia kunye ne-hydrofluoric acid. Ikakhulu kwiikhompawundi ezine-+4 valence. I-Hafnium alloy (Ta4HfC5) yaziwa ngokuba neyona ndawo iphezulu yokunyibilika (malunga ne-4215 ℃).
Ubume beCrystal: Iseli yekristale inamacala amathandathu
Inombolo ye-CAS: 7440-58-6
Indawo yokunyibilikisa: 2227 ℃
Indawo yokubilisa: 4602 ℃
Iimpawu zemichiza:
Iimpawu zeekhemikhali ze-hafnium zifana kakhulu nezo ze-zirconium, kwaye inokumelana nokugqwala okulungileyo kwaye ayifuni ukugqweswa ngokulula zizisombululo ze-asidi ze-alkali ezimanzi; Inyibilika ngokulula kwi-hydrofluoric acid ukwenza i-fluorinated complexes. Kwiqondo lokushisa eliphezulu, i-hafnium inokudibanisa ngokuthe ngqo kunye neegesi ezifana ne-oksijini kunye ne-nitrogen ukwenza i-oxides kunye ne-nitrides.
I-Hafnium ihlala ine-+4 valence kwiikhompawundi. Ikhompawundi engundoqo yii-hafnium oxideHfO2. Kukho iintlobo ezintathu ezahlukeneyo ze-hafnium oxide:i-hafnium oxideefunyenwe ngokubala okuqhubekayo kwe-hafnium sulfate kunye ne-chloride oxide i-monoclinic variant; I-hafnium oxide efunyenwe ngokufudumeza i-hydroxide ye-hafnium malunga ne-400 ℃ yinto eyahlukileyo ye-tetragonal; Ukuba ibalwe ngaphezu kwe-1000 ℃, iyantlukwano ye-cubic inokufumaneka. Enye ikhompawundii-hafnium tetrachloride, into ekrwada yokulungiselela i-metal hafnium kwaye inokulungiswa ngokuphendula igesi ye-chlorine kumxube we-hafnium oxide kunye nekhabhoni. I-Hafnium tetrachloride idibana namanzi kwaye ngokukhawuleza i-hydrolyzes ibe yi-HfO (4H2O) ezinzileyo kakhulu ye-2 + ion. I-HfO2 + ion ikhona kwiikhompawundi ezininzi ze-hafnium, kwaye iyakwazi ukuqaqambisa inaliti emile njenge-hydrated hafnium oxychloride HfOCl2 · 8H2O iikristale kwi-hydrochloric acid acidified hafnium tetrachloride isisombululo.
I-4-valent hafnium iyakwazi ukwenza ii-complexes ezine-fluoride, equka i-K2HfF6, i-K3HfF7, (NH4) 2HfF6, kunye (NH4) 3HfF7. Ezi zixhobo zisetyenziselwa ukuhlukana kwe-zirconium kunye ne-hafnium.
Iikhompawundi eziqhelekileyo:
IHafnium dioxide: igama elithi Hafnium dioxide; IHafnium dioxide; Ifomula yemolekyuli: HfO2 [4]; Ipropati: Umgubo omhlophe kunye nezakhiwo ezintathu zekristale: i-monoclinic, i-tetragonal, kunye ne-cubic. Uxinaniso luyi-10.3, 10.1, kunye ne-10.43g / cm3, ngokulandelanayo. Indawo yokunyibilika 2780-2920K. Indawo yokubilisa 5400K. I-coefficient yokwandisa i-Thermal 5.8 × 10-6/℃. Ayinyibiliki emanzini, i-hydrochloric acid, kunye ne-nitric acid, kodwa i-soluble kwi-concentrated sulfuric acid kunye ne-hydrofluoric acid. Iveliswe ngokubola kwe-thermal okanye i-hydrolysis yeekhompawundi ezifana ne-hafnium sulfate kunye ne-hafnium oxychloride. Izinto eziluhlaza zokuvelisa i-metal hafnium kunye ne-hafnium alloys. Isetyenziswa njengezinto zokunqanda, ii-anti radioactive coatings, kunye ne-catalysts. [5] Inqanaba lamandla e-atom i-HfO yimveliso efunyenwe ngaxeshanye xa kusenziwa inqanaba lamandla e-atom i-ZrO. Ukuqala kwi-chlorination yesibini, iinkqubo zokuhlanjululwa, ukunciphisa, kunye ne-vacuum distillation ziphantse zifane nezo ze-zirconium.
IHafnium tetrachloride: I-Hafnium (IV) i-chloride, i-Hafnium tetrachloride I-molecular formula HfCl4 Ubunzima be-Molecular 320.30 Umlingiswa: Ibhloko ye-crystalline emhlophe. Uvakalelo kukufuma. Inyibilika kwi-acetone kunye ne-methanol. I-Hydrolyze emanzini ukuvelisa i-hafnium oxychloride (HfOCl2). Fudumeza ukuya kuma-250 ℃ kwaye ube ngumphunga. Ukucaphukisa amehlo, inkqubo yokuphefumla, kunye nolusu.
I-Hafnium hydroxide: I-Hafnium hydroxide (H4HfO4), ngokuqhelekileyo ikhona njenge-hydrated oxide HfO2 · nH2O, ayinyibiliki emanzini, i-soluble kalula kwi-acids inorganic acid, i-insoluble kwi-ammonia, kwaye inqabile ukunyibilika kwi-sodium hydroxide. Ubushushu ukuya kwi-100 ℃ ukwenza i-hafnium hydroxide HfO (OH) 2. I-hafnium hydroxide precipitate emhlophe inokufunyanwa ngokusabela i-hafnium (IV) ityuwa ngamanzi ammonia. Ingasetyenziselwa ukuvelisa ezinye iikhompawundi ze-hafnium.
Imbali yoPhando
Imbali yokuFumana:
Ngomnyaka we-1923, i-chemist yaseSweden uHervey kunye ne-Dutch physicist u-D. Koster wafumanisa i-hafnium kwi-zircon eveliswe eNorway naseGreenland, kwaye wayibiza ngokuba yi-hafnium, ephuma kwigama lesiLatini elithi Hafnia yaseCopenhagen. Kwi-1925, uHervey noCoster bahlula i-zirconium kunye ne-titanium besebenzisa indlela ye-crystallization ye-fractional ye-fluorinated complex salts ukufumana i-hafnium salts ecocekileyo; Kwaye unciphise ityuwa ye-hafnium nge-metallic sodium ukuze ufumane i-hafnium yensimbi ecocekileyo. UHervey ulungiselele isampuli yeemiligram ezininzi ze-hafnium ecocekileyo.
Uvavanyo lwemichiza kwi-zirconium kunye ne-hafnium:
Kuvavanyo olwenziwa nguNjingalwazi uCarl Collins kwiDyunivesithi yaseTexas ngo-1998, kwathiwa i-gamma irradiated hafnium 178m2 (iisomer hafnium-178m2 [7]) inokukhupha amandla amakhulu, ayiodolo ezintlanu zobukhulu ngaphezulu kuneentshukumo zekhemikhali kodwa. imilinganiselo emithathu yobukhulu engaphantsi kuneempendulo zenyukliya. [8] I-Hf178m2 (i-hafnium 178m2) inobude bobomi obude phakathi kwee-isotopi ezifanayo ezihlala ixesha elide: i-Hf178m2 (i-hafnium 178m2) inobomi besiqingatha seminyaka engama-31, okukhokelela kwi-radioactivity yendalo emalunga ne-1.6 yetriliyoni ye-Becquerels. Ingxelo kaCollins ithi igram enye ye-Hf178m2 esulungekileyo (hafnium 178m2) iqulethe malunga ne-1330 megajoules, elingana namandla akhutshwe kukudubula kweekhilogram ezingama-300 zeziqhushumbisi ze-TNT. Ingxelo kaCollins ibonisa ukuba onke amandla kule ndlela yokusabela akhululwa ngendlela yee-X-reyi okanye imitha ye-gamma, ekhupha amandla ngesantya esikhawulezayo esigqithisileyo, kwaye i-Hf178m2 (hafnium 178m2) isenokuthi isabele kwindawo ephantsi kakhulu. [9] IPentagon inike imali yophando. Kuvavanyo, umlinganiselo wesignali ukuya kwingxolo wawuphantsi kakhulu (kunye neempazamo ezibalulekileyo), kwaye ukususela ngoko, nangona iimvavanyo ezininzi zenzululwazi ezivela kwimibutho emininzi kuquka i-United States yeSebe lezoKhuselo i-Arhente yoPhando lweeProjekthi eziPhambili (i-DARPA) kunye ne-JASON Defense Advisory. Iqela [13], akukho nzululwazi eye yakwazi ukufezekisa le mpendulo phantsi kweemeko ezifunwa nguCollins, kwaye uCollins akazange anike ubungqina obuqinileyo bokubonisa ubukho bokusabela, uCollins ucebise indlela yokusebenzisa ukukhutshwa kwe-gamma ray ukukhulula amandla Hf178m2 (hafnium 178m2) [15], kodwa ezinye izazinzulu ziye zangqina ngokwethiyori ukuba le mpendulo ayinakufezekiswa. [16] I-Hf178m2 (hafnium 178m2) ikholelwa ngokubanzi kuluntu lwezemfundo ukuba ingabi ngumthombo wamandla.
Indawo yesicelo:
I-Hafnium iluncedo kakhulu ngenxa yokukwazi ukukhupha ii-electron, njengokuba isetyenziswa njenge-filament kwizibane ze-incandescent. Isetyenziswe njenge-cathode yeetyhubhu ze-X-ray, kunye ne-alloys ye-hafnium kunye ne-tungsten okanye i-molybdenum isetyenziswe njenge-electrodes ye-high-voltage discharge tubes. Ngokuqhelekileyo isetyenziswa kwishishini le-cathode kunye ne-tungsten yokuvelisa i-X-reyi. I-hafnium ecocekileyo yimathiriyeli ebalulekileyo kwishishini lamandla eathom ngenxa yeplastiki yayo, ukusetyenzwa lula, ukumelana nobushushu obuphezulu, kunye nokumelana nokugqwala. I-Hafnium ine-thermal neutron enkulu yokubamba i-cross-section kwaye i-absorber i-neutron efanelekileyo, enokusetyenziswa njengentonga yokulawula kunye nesixhobo sokukhusela ii-athom reactors. I-Hafnium powder ingasetyenziswa njenge-propellant yeerokethi. I-cathode yeetyhubhu ze-X-ray inokuveliswa kwishishini lombane. Ingxubevange yeHafnium inokusebenza njengomaleko okhuselayo wangaphambili wemibhobho yerocket kunye nenqwelomoya yokungena kwakhona, ngelixa i-Hf Ta ialloy ingasetyenziselwa ukwenza isixhobo sentsimbi kunye nezixhobo zokuxhathisa. I-Hafnium isetyenziswa njengento eyongezayo kwi-alloys ekwazi ukumelana nobushushu, njenge-tungsten, i-molybdenum, kunye ne-tantalum. I-HfC ingasetyenziswa njenge-additive for alloys eqinile ngenxa yobunzima bayo obuphezulu kunye nendawo yokunyibilika. Indawo yokunyibilika ye-4TaCHfC imalunga ne-4215 ℃, nto leyo eyenza ibe yikhompawundi eneyona ndawo iphezulu yokunyibilika eyaziwayo. I-Hafnium ingasetyenziswa njenge-getter kwiinkqubo ezininzi zokunyuka kwamaxabiso. Abafumana iHafnium banokususa iigesi ezingafunekiyo ezifana neoksijini kunye nenitrogen ekhoyo kwinkqubo. I-Hafnium isoloko isetyenziswa njengesongezo kwioli ye-hydraulic ukuthintela ukuguquguquka kweoyile ye-hydraulic ngexesha lemisebenzi enobungozi obuphezulu, kwaye ineempawu ezinamandla zokuchasana nokuguquguquka. Ke ngoko, isetyenziswa ngokubanzi kwioyile ye-hydraulic yeshishini. Ioli ye-hydraulic yonyango.
I-Hafnium element iphinda isetyenziswe kwi-Intel 45 nanoprocessors zamva nje. Ngenxa yokwenziwa kwe-silicon dioxide (SiO2) kunye nokukwazi kwayo ukunciphisa ubukhulu ukuze kuphuculwe ngokuqhubekayo ukusebenza kwe-transistor, abavelisi beprosesa basebenzisa i-silicon dioxide njengesixhobo se-dielectrics yesango. Xa i-Intel yazisa inkqubo yokuvelisa i-nanometer engama-65, nangona yenze yonke imizamo yokunciphisa ubukhulu be-silicon dioxide gate dielectric ukuya kwi-1.2 nanometers, elingana ne-5 layers ye-athomu, ubunzima bokusetyenziswa kwamandla kunye nokuchithwa kobushushu buya kwanda xa i-transistor. yancitshiswa yaya kutsho kubungakanani beathom, nto leyo ekhokelele kwinkcitho yangoku kunye namandla obushushu angeyomfuneko. Ngoko ke, ukuba izinto zangoku ziyaqhubeka zisetyenziswa kwaye ubukhulu buyancipha ngakumbi, ukuvuza kwesango le-dielectric kuya kwanda kakhulu, Ukuzisa iteknoloji ye-transistor kwimida yayo. Ukujongana nalo mbandela ubalulekileyo, i-Intel iceba ukusebenzisa izixhobo ezityebileyo ze-K (izixhobo ezisekelwe kwi-hafnium) njenge-dielectrics yesango endaweni ye-silicon dioxide, ethe yanciphisa ngempumelelo ukuvuza ngamaxesha angaphezu kwe-10. Xa kuthelekiswa nesizukulwana sangaphambili setekhnoloji ye-65nm, inkqubo ye-Intel ye-45nm yonyusa ingxinano ye-transistor phantse kabini, ivumela ukwanda kwenani elipheleleyo le-transistors okanye ukunciphisa umthamo weprosesa. Ukongeza, amandla afunekayo ekutshintsheni i-transistor aphantsi, ukunciphisa ukusetyenziswa kwamandla phantse ngama-30%. Udibaniso lwangaphakathi lwenziwe ngocingo lobhedu oludityaniswe ne-k dielectric ephantsi, ngokutyibilikayo ukuphucula ukusebenza kakuhle kunye nokunciphisa ukusetyenziswa kwamandla, kwaye isantya sokutshintsha simalunga nama-20% ngokukhawuleza.
Ukuhanjiswa kwezimbiwa:
I-Hafnium inobuninzi be-crustal obuphezulu kunesinyithi esisetyenziswa rhoqo njenge-bismuth, i-cadmium, kunye ne-mercury, kwaye ilingana nomxholo we-beryllium, i-germanium, kunye ne-uranium. Zonke iiminerali eziqukethe i-zirconium ziqulethe i-hafnium. I-Zircon esetyenziswe kwishishini iqulethe i-0.5-2% ye-hafnium. I-beryllium zircon (i-Alvite) kwi-ore yesibini ye-zirconium inokuquka ukuya kwi-15% ye-hafnium. Kukho kwakhona uhlobo lwe-metamorphic zircon, i-cyrtolite, equkethe ngaphezu kwe-5% ye-HfO. Oovimba bezimbiwa zimbini zokugqibela bancinci kwaye abakamkelwa kushishino. I-Hafnium ifunyanwa kakhulu ngexesha lokuveliswa kwe-zirconium.
Ikhona kwii-ore ezininzi ze-zirconium. [18] [19] Kuba kukho umxholo omncinane kakhulu kuqweqwe. Ihlala ihlala kunye ne-zirconium kwaye ayinayo i-ore eyahlukileyo.
Indlela yokulungiselela:
1. Inokulungiswa ngokunciphisa i-magnesium ye-hafnium tetrachloride okanye ukuchithwa kwe-thermal ye-hafnium iodide. I-HfCl4 kunye ne-K2HfF6 nazo zingasetyenziswa njengemathiriyeli ekrwada. Inkqubo yokuveliswa kwe-electrolytic kwi-NaCl KCl HfCl4 okanye i-K2HfF6 inyibilika ifana neyokuvelisa i-electrolytic ye-zirconium.
2. I-Hafnium ihlangana kunye ne-zirconium, kwaye akukho nto yahlukileyo ekrwada ye-hafnium. Izinto eziluhlaza zokwenza i-hafnium yi-hafnium oxide ekrwada ehlulwe ngexesha lenkqubo yokwenziwa kwe-zirconium. Khipha i-hafnium oxide usebenzisa i-ion exchange resin, kwaye usebenzise indlela efanayo ne-zirconium ukulungisa isinyithi se-hafnium kule hafnium oxide.
3. Iyakwazi ukulungiswa ngokushisa i-hafnium tetrachloride (HfCl4) kunye ne-sodium ngokunciphisa.
Iindlela zokuqala zokwahlula i-zirconium kunye ne-hafnium yayiyi-crystallization ye-fractional ye-fluorinated complex salts kunye ne-fractional precipitation ye-phosphates. Ezi ndlela zinzima ukusebenza kwaye zilinganiselwe kusetyenziso lwebhubhoratri. Ubuchwephesha obutsha bokwahlula i-zirconium kunye ne-hafnium, njenge-fractionation distillation, i-solvent extraction, i-ion exchange, kunye ne-adsorption ye-fractionation, iye yavela enye emva kwenye, kunye ne-solvent extraction iyasebenza ngakumbi. Iinkqubo ezimbini ezisetyenziswa ngokuqhelekileyo zokwahlula yinkqubo ye-thiocyanate cyclohexanone kunye nenkqubo ye-tributyl phosphate nitric acid. Iimveliso ezifunyenwe ngezi ndlela zingentla zonke ziyi-hafnium hydroxide, kunye ne-hafnium oxide ecocekileyo inokufumaneka ngokubala. Ukucoceka okuphezulu kwe-hafnium kunokufumaneka ngendlela yokutshintshiselana kwe-ion.
Kwishishini, ukuveliswa kwe-metal hafnium kudla ngokubandakanya inkqubo yeKroll kunye nenkqubo yeDebor Aker. Inkqubo yeKroll ibandakanya ukuncitshiswa kwe-hafnium tetrachloride usebenzisa i-metallic magnesium:
2Mg+HfCl4- → 2MgCl2+Hf
Indlela ye-Debor Aker, ekwabizwa ngokuba yindlela ye-iodization, isetyenziselwa ukuhlambulula isiponji njenge-hafnium kunye nokufumana i-hafnium yensimbi ethambileyo.
5. Ukunyibilikiswa kwe-hafnium ngokusisiseko kuyafana naleyo ye-zirconium:
Isinyathelo sokuqala kukuchithwa kwe-ore, ebandakanya iindlela ezintathu: i-chlorination ye-zircon ukufumana (Zr, Hf) Cl. Ukunyibilika kwe-alkali ye-zircon. I-Zircon iyancibilika kunye ne-NaOH malunga ne-600, kwaye ngaphezu kwe-90% ye (Zr, Hf) i-O iguqulela kwi-Na (Zr, Hf) O, kunye ne-SiO iguqulelwe kwi-NaSiO, echithwa emanzini ukuze isuswe. I-Na (Zr, Hf) O ingasetyenziselwa njengesisombululo sokuqala sokuhlukanisa i-zirconium kunye ne-hafnium emva kokuchithwa kwi-HNO. Nangona kunjalo, ubukho be-SiO colloids benza ukwahlukana kwe-solvent extraction kube nzima. I-Sinter nge-KSiF kwaye ifunxe emanzini ukufumana isisombululo se-K (Zr, Hf) F. Isisombululo sinokuhlula i-zirconium kunye ne-hafnium ngokusebenzisa i-crystallization ye-fractional;
Isinyathelo sesibini kukuhlukana kwe-zirconium kunye ne-hafnium, enokufezekiswa ngokusebenzisa iindlela zokwahlula i-solvent extraction usebenzisa i-hydrochloric acid MIBK (i-methyl isobutyl ketone) inkqubo kunye ne-HNO-TBP (i-tributyl phosphate) inkqubo. Itekhnoloji ye-multi-stage fractionation isebenzisa ukuhlukana koxinzelelo lomphunga phakathi kwe-HfCl kunye ne-ZrCl iyancibilika phantsi koxinzelelo oluphezulu (ngaphezu kwe-atmospheres ye-20) sele ifundwe ixesha elide, elinokugcina inkqubo ye-chlorination yesibini kunye nokunciphisa iindleko. Nangona kunjalo, ngenxa yengxaki ye-corrosion ye-(Zr, Hf) Cl kunye ne-HCl, akulula ukufumana izinto ezifanelekileyo zekholamu ye-fractionation, kwaye iya kunciphisa umgangatho we-ZrCl kunye ne-HfCl, ukwandisa iindleko zokucoca. Ngeminyaka yee-1970, yayisekwinqanaba eliphakathi lovavanyo lwezityalo;
Isinyathelo sesithathu yiklorination yesibini ye-HfO ukufumana i-HfCl ekrwada yokunciphisa;
Isinyathelo sesine kukuhlanjululwa kwe-HfCl kunye nokunciphisa i-magnesium. Le nkqubo iyafana nokuhlanjululwa kunye nokunciphisa i-ZrCl, kunye nesiphumo se-semi-finished imveliso yi-sponge enqabileyo ye-hafnium;
Inyathelo lesihlanu kukutshayela i-distill crude sponge hafnium ukususa i-MgCl kunye nokubuyisela i-magnesium yesinyithi engaphezulu, okukhokelela kwimveliso egqityiweyo ye-sponge metal hafnium. Ukuba i-arhente yokunciphisa isebenzisa i-sodium endaweni ye-magnesium, isinyathelo sesihlanu kufuneka sitshintshwe ukucwiliswa kwamanzi
Indlela yokugcina:
Gcina kwindawo epholileyo nengena umoya. Zigcine kude neentlantsi kunye nemithombo yobushushu. Kufuneka igcinwe ngokwahlukileyo kwi-oxidants, i-acids, i-halogens, njl., kwaye ugweme ukuxuba ukugcinwa. Ukusebenzisa izibane ezingagqabhukiyo kunye nezixhobo zokungenisa umoya. Ukuthintela ukusetyenziswa kwezixhobo zoomatshini kunye nezixhobo ezithandwa ziintlantsi. Indawo yokugcina kufuneka ixhotyiswe ngezinto ezifanelekileyo zokuqulatha ukuvuza.
Ixesha lokuposa: Sep-25-2023